Electrolytic deposition of platinum,iridium and their alloys
    1.
    发明授权
    Electrolytic deposition of platinum,iridium and their alloys 失效
    铂,铱及其合金的电沉积

    公开(公告)号:US3841980A

    公开(公告)日:1974-10-15

    申请号:US31088472

    申请日:1972-11-30

    Applicant: RHONE PROGIL

    CPC classification number: C25D3/567 C25D3/50

    Abstract: 1. BATHS, WHICH ARE AQUEOUS AND ACIDIC AND SUBSTANTIALLY BROMIDE-ION FREE, FOR THE DEPOSITION BY ELECTROLYSIS OF PLATINUM AND/OR IRIDIUM, CHARACTERIZED BY THE FACT THAT THEY ARE FORMED OF COMPOUNDS OF PLATINUM AND/OR IRIDIUM GIVING IN AQUEOUS SOLUTION PRIMARILY THE BROMOIRIDIC AND BROMOPLATINIC ANIONS, AND OF AT LEAST ONE ACID SELECTED FROM THE GROUP CONSISTING OF NITRIC, SULFURIC, PERCHLORIC AND BROMIC ACIDS, AND IN WHICH THE PLATINUM AND/OR IRIDIUM CONCENTRATIONS ARE BETWEEN ABOUT 0.1 GRAM AND 60 GRAMS PER LITER AND THE SAID ACID IS PRESENT IN AN AMOUNT OF BETWEEN ABOUT 0.05 AND 1 EQUIVALENT PER LITER OF BATH.

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