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公开(公告)号：US20190012823A1
公开(公告)日：2019-01-10
申请号：US15645360
申请日：2017-07-10
申请人： Reuven Bakalash , Gal Hochberg
发明人： Reuven Bakalash , Gal Hochberg
摘要： Aspects comprise a ray tracing system based on data structure of a uniform grid of cells, and on local stencils in cells. The high traversal and construction costs of accelerating structures, typical to the prior art ray tracing, are greatly reduced. The stencils, generated in a preprocessing phase, hold visibility information, for a runtime use. Each cell achieves high locality, allowing improved parallel processing.
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公开(公告)号：US20180308279A1
公开(公告)日：2018-10-25
申请号：US15494458
申请日：2017-04-22
申请人： Reuven Bakalash , Gal Hochberg
发明人： Reuven Bakalash , Gal Hochberg
CPC分类号： G06T15/60 , G06T15/005 , G06T15/06 , G06T2210/52 , G06T2215/12
摘要： Aspects comprise shadowing system as part of ray tracing. It is based on uniform grid of cells, and on local stencils in cells. The acceleration structures are abandoned along with high traversal and construction costs of these structures. The amount of intersection tests is cut down. The stencils are generated in the preprocessing stage and utilized in runtime. The relevant part of scene data, critical for shadowing of all visible intersection points in a cell, is registered in the local stencil map, as a volumetric data. The runtime use of stencils allows a complete locality at each cell, enhanced utilization of processing resources and load balancing of parallel processing.
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