公开(公告)号：US20180370848A1

公开(公告)日：2018-12-27

申请号：US16062943

申请日：2016-12-14

Applicant: Rhodia Operations

Inventor： Wei Hong SONG ,  Ning ZHU ,  Shangjun DING ,  Haiting WU ,  Qian WANG

IPC: C03C15/02 ,  C09G1/02

Abstract: The present invention concerns a method for polishing a phosphate glass or fluorophosphate glass substrate comprising polishing the surface of said substrate using at least a formulation having a pH comprised between 7 and 14 comprising at least a cerium containing abrasive, an anionic water-soluble polymer dispersant, an anti-caking agent, optionally a co-dispersant and water.