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公开(公告)号：US07101810B2
公开(公告)日：2006-09-05
申请号：US11102412
申请日：2005-04-07
申请人： Robert Bond , Roger P. Stanek , Wayne L. Hoffman
发明人： Robert Bond , Roger P. Stanek , Wayne L. Hoffman
IPC分类号： H01L21/469
CPC分类号： C03C17/3615 , C03C17/36 , C03C17/3618 , C03C17/3626 , C03C17/3639 , C03C17/3642 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3681 , C03C2217/78 , C03C2218/154 , G02B1/105 , G02B1/14 , G02B5/208 , Y10T428/24975 , Y10T428/265
摘要： Transparent articles comprising transparent, nonmetallic substrate and a transparent film stack is sputter deposited on the substrate. The film stack is characterized by including at least one infrared reflective metal film, a dielectric film over the metal film, and a protective silicon nitride film of 10 Å to 150 Å in thickness over the said dielectric film. The dielectric film desirably has substantially the same index of refraction as does silicon nitride and is contiguous with the silicon nitride film.
摘要翻译： 包含透明非金属基底和透明膜叠层的透明物品被溅射沉积在基底上。 膜叠层的特征在于在所述介电膜上包括至少一个红外反射金属膜，金属膜上的电介质膜和厚度为10埃至150埃的保护性氮化硅膜。 电介质膜理想地具有与氮化硅基本上相同的折射率并且与氮化硅膜邻接。
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公开(公告)号：US06942917B2
公开(公告)日：2005-09-13
申请号：US10724485
申请日：2003-11-28
申请人： Robert Bond , Roger P. Stanek , Wayne Hoffman
发明人： Robert Bond , Roger P. Stanek , Wayne Hoffman
CPC分类号： C03C17/3615 , C03C17/36 , C03C17/3618 , C03C17/3626 , C03C17/3639 , C03C17/3642 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3681 , C03C2217/78 , C03C2218/154 , G02B1/105 , G02B1/14 , G02B5/208 , Y10T428/24975 , Y10T428/265
摘要： Transparent articles comprising transparent, nonmetallic substrate and a transparent film stack is sputter deposited on the substrate. The film stack is characterized by including at least one infrared reflective metal film, a dielectric film over the metal film, and a protective silicon nitride film of 10 Å to 150 Å in thickness over the said dielectric film. The dielectric film desirably has substantially the same index of refraction as does silicon nitride and is contiguous with the silicon nitride film.
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公开(公告)号：US5834103A
公开(公告)日：1998-11-10
申请号：US547690
申请日：1995-10-19
申请人： Robert Bond , Roger P. Stanek , Wayne Hoffman
发明人： Robert Bond , Roger P. Stanek , Wayne Hoffman
CPC分类号： C03C17/3615 , C03C17/36 , C03C17/3618 , C03C17/3626 , C03C17/3639 , C03C17/3642 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3681 , G02B1/105 , C03C2217/78 , Y10T428/24975
摘要： Transparent articles comprising transparent, nonmetallic substrate and a transparent film stack is sputter deposited on the substrate. The film stack is characterized by including at least one infrared reflective metal film, a dielectric film over the metal film, and a protective silicon nitride film of 10 .ANG. to 150 .ANG. in thickness over the said dielectric film. The dielectric film desirably has substantially the same index of refraction as does silicon nitride and is contiguous with the silicon nitride film.
摘要翻译： 包含透明非金属基底和透明膜叠层的透明物品被溅射沉积在基底上。 膜堆的特征在于包括至少一个红外反射金属膜，金属膜上的电介质膜和在所述电介质膜上的厚度为10至150的保护氮化硅膜。 电介质膜理想地具有与氮化硅基本上相同的折射率并且与氮化硅膜邻接。
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公开(公告)号：US06673438B1
公开(公告)日：2004-01-06
申请号：US09189284
申请日：1998-11-10
申请人： Robert Bond , Roger P. Stanek , Wayne Hoffman
发明人： Robert Bond , Roger P. Stanek , Wayne Hoffman
IPC分类号： B32B702
CPC分类号： C03C17/3615 , C03C17/36 , C03C17/3618 , C03C17/3626 , C03C17/3639 , C03C17/3642 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3681 , C03C2217/78 , C03C2218/154 , G02B1/105 , G02B1/14 , G02B5/208 , Y10T428/24975 , Y10T428/265
摘要： Transparent articles comprising transparent, nonmetallic substrate and a transparent film stack is sputter deposited on the substrate. The film stack is characterized by including at least one infrared reflective metal film, a dielectric film over the metal film, and a protective silicon nitride film of 10 Å to 150 Å in thickness over the said dielectric film. The dielectric film desirably has substantially the same index of refraction as does silicon nitride and is contiguous with the silicon nitride film.
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