专利检索 ap:("Robert E. Fontana, Jr." OR "Jordan A. Katine" OR "Ernst Kratschmer" OR "Michael J. Rooks" OR "Ching H. Tsang" OR "Raman Gobichettipalayam Viswanathan") AND inv:"Ernst Kratschmer" 第 1 页

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发明授权
High-aspect ratio resist development using safe-solvent mixtures of alcohol and water 失效
标题翻译：使用酒精和水的安全溶剂混合物的高纵横比抗蚀剂显影

公开(公告)号：US06440639B1

公开(公告)日：2002-08-27

申请号：US09672187

申请日：2000-09-28

申请人： Robert E. Fontana, Jr. , Jordan A. Katine , Ernst Kratschmer , Michael J. Rooks , Ching H. Tsang , Raman Gobichettipalayam Viswanathan

发明人： Robert E. Fontana, Jr. , Jordan A. Katine , Ernst Kratschmer , Michael J. Rooks , Ching H. Tsang , Raman Gobichettipalayam Viswanathan

IPC分类号： G03C516

CPC分类号： G03F7/322 , G03F7/00

摘要： A high-aspect ratio resist profile is obtained using a development process wherein a mixture of an alcohol and water is used as the developer. The alcohol/water mixture is non-toxic, and does not cause excess swelling and cracking of the resist during the development process.

摘要翻译： 使用醇和水的混合物作为显影剂的显影方法获得高纵横比抗蚀剂轮廓。醇/水混合物是无毒的，并且在显影过程中不会引起抗蚀剂的过度膨胀和开裂。