Comprehensive analysis of queue times in microelectronic manufacturing
    1.
    发明授权
    Comprehensive analysis of queue times in microelectronic manufacturing 失效
    微电子制造队列时间综合分析

    公开(公告)号:US08718809B2

    公开(公告)日:2014-05-06

    申请号:US12778457

    申请日:2010-05-12

    IPC分类号: G06F19/00

    CPC分类号: G06N99/005 G06F2217/10

    摘要: A system for determining a group of semiconductor manufacturing process steps with a similar influence on individual semiconductor products. The system generates a first table including time stamps for the individual semiconductor products. The system creates a second table including Q-times based on the first table. The Q-times refers to time differences between every pair of the time stamps. The system forms a dependency table by grouping the Q-times with similar dependencies together. The system identifies groups of the similar dependencies. The system extracts semiconductor process steps belonging to the groups.

    摘要翻译: 一种用于确定对各个半导体产品具有相似影响的一组半导体制造工艺步骤的系统。 该系统产生包括各个半导体产品的时间戳的第一表。 系统创建第二个表,其中包括基于第一个表的Q次。 Q时间是指每对时间戳之间的时差。 系统通过将Q次与相似的依赖关系分组在一起来形成依赖关系表。 系统识别类似依赖关系的组。 系统提取属于这些组的半导体工艺步骤。

    Enhancing investigation of variability by inclusion of similar objects with known differences to the original ones
    2.
    发明授权
    Enhancing investigation of variability by inclusion of similar objects with known differences to the original ones 有权
    通过将具有已知差异的相似对象与原始对象相结合,来增强对变异性的调查

    公开(公告)号:US08315729B2

    公开(公告)日:2012-11-20

    申请号:US12775107

    申请日:2010-05-06

    IPC分类号: G06F17/00 G06F11/30

    摘要: A system, method and/or computer program product for analyzing a functionality of at least two manufactured products obtain a first characteristic of a first manufactured product. The system acquires a second characteristic of a second manufactured product. The system identifies a common feature between the first characteristic and the second characteristic. The system identifies a distinguishable feature between the first characteristic and the second characteristic. The system determines a cause of a deviation of a functionality in the first manufactured product or the second manufactured product or both manufactured products based on the identified common feature or the identified distinguishable feature or both features.

    摘要翻译: 用于分析至少两个制造产品的功能的系统,方法和/或计算机程序产品获得第一制成品的第一特征。 该系统获得第二制造产品的第二特性。 该系统识别第一特征和第二特性之间的共同特征。 该系统识别第一特征和第二特性之间的区别特征。 该系统基于所识别的共同特征或所识别的可区分特征或两个特征来确定第一制造产品或第二制造产品或两个制造产品中的功能性偏差的原因。

    ENHANCING INVESTIGATION OF VARIABILITY BY INCLUSION OF SIMILAR OBJECTS WITH KNOWN DIFFERENCES TO THE ORIGINAL ONES
    3.
    发明申请
    ENHANCING INVESTIGATION OF VARIABILITY BY INCLUSION OF SIMILAR OBJECTS WITH KNOWN DIFFERENCES TO THE ORIGINAL ONES 有权
    通过将具有已知差异的类似对象包含在原始主题中来增强可变性的调查

    公开(公告)号:US20110276170A1

    公开(公告)日:2011-11-10

    申请号:US12775107

    申请日:2010-05-06

    IPC分类号: G06F17/00

    摘要: A system, method and/or computer program product for analyzing a functionality of at least two manufactured products obtain a first characteristic of a first manufactured product. The system acquires a second characteristic of a second manufactured product. The system identifies a common feature between the first characteristic and the second characteristic. The system identifies a distinguishable feature between the first characteristic and the second characteristic. The system determines a cause of a deviation of a functionality in the first manufactured product or the second manufactured product or both manufactured products based on the identified common feature or the identified distinguishable feature or both features.

    摘要翻译: 用于分析至少两个制造产品的功能的系统,方法和/或计算机程序产品获得第一制成品的第一特征。 该系统获得第二制造产品的第二特性。 该系统识别第一特征和第二特性之间的共同特征。 该系统识别第一特征和第二特性之间的区别特征。 该系统基于所识别的共同特征或所识别的可区分特征或两个特征来确定第一制造产品或第二制造产品或两个制造产品中的功能性偏差的原因。

    Foreign material contamination detection
    4.
    发明授权
    Foreign material contamination detection 有权
    异物污染检测

    公开(公告)号:US08328950B2

    公开(公告)日:2012-12-11

    申请号:US12783702

    申请日:2010-05-20

    IPC分类号: B08B7/04

    摘要: There are provided a system, method and computer program product for detecting foreign materials in a semiconductor manufacturing process. The manufacturing process uses a plurality of semiconductor manufacturing tools. The system categorizes at least one monitoring wafer according to one or more categories. The system supplies the categorized monitoring wafer to a semiconductor manufacturing tool. The system observes a level of contamination on the categorized monitoring wafer. The system compares the level of contamination to a threshold. The system cleans the tool in a response to determining that the level of contamination is larger than the threshold. The system determines which category of the wafer leaves a highest level of contamination on the tool. The system identifies a root cause of the highest level of contamination on the tool.

    摘要翻译: 提供了一种用于在半导体制造工艺中检测异物的系统,方法和计算机程序产品。 制造工艺使用多个半导体制造工具。 该系统根据一个或多个类别对至少一个监视晶片进行分类。 该系统将分类的监控晶片提供给半导体制造工具。 该系统观察到分类监控晶片的污染程度。 系统将污染水平与阈值进行比较。 系统在响应中清洁工具以确定污染物的水平大于阈值。 该系统确定哪个类别的晶片在工具上留下最高的污染水平。 系统识别工具上最高污染水平的根本原因。

    COMPREHENSIVE ANALYSIS OF QUEUE TIMES IN MICROELECTRONIC MANUFACTURING
    5.
    发明申请
    COMPREHENSIVE ANALYSIS OF QUEUE TIMES IN MICROELECTRONIC MANUFACTURING 失效
    微电子制造中队列时间的综合分析

    公开(公告)号:US20110282472A1

    公开(公告)日:2011-11-17

    申请号:US12778457

    申请日:2010-05-12

    IPC分类号: G06F17/50 G06N5/02

    CPC分类号: G06N99/005 G06F2217/10

    摘要: A system for determining a group of semiconductor manufacturing process steps with a similar influence on individual semiconductor products. The system generates a first table including time stamps for the individual semiconductor products. The system creates a second table including Q-times based on the first table. The Q-times refers to time differences between every pair of the time stamps. The system forms a dependency table by grouping the Q-times with similar dependencies together. The system identifies groups of the similar dependencies. The system extracts semiconductor process steps belonging to the groups.

    摘要翻译: 一种用于确定对各个半导体产品具有相似影响的一组半导体制造工艺步骤的系统。 该系统产生包括各个半导体产品的时间戳的第一表。 系统创建第二个表,其中包括基于第一个表的Q次。 Q时间是指每对时间戳之间的时差。 系统通过将Q次与相似的依赖关系分组在一起来形成依赖关系表。 系统识别类似依赖关系的组。 系统提取属于这些组的半导体工艺步骤。

    COMPREHENSIVE ANALYSIS OF QUEUE TIMES IN MICROELECTRONIC MANUFACTURING
    6.
    发明申请
    COMPREHENSIVE ANALYSIS OF QUEUE TIMES IN MICROELECTRONIC MANUFACTURING 有权
    微电子制造中队列时间的综合分析

    公开(公告)号:US20120330450A1

    公开(公告)日:2012-12-27

    申请号:US13604986

    申请日:2012-09-06

    IPC分类号: G06F17/50

    CPC分类号: G06N99/005 G06F2217/10

    摘要: A system for determining a group of semiconductor manufacturing process steps with a similar influence on individual semiconductor products. The system generates a first table including time stamps for the individual semiconductor products. The system creates a second table including Q-times based on the first table. The Q-times refers to time differences between every pair of the time stamps. The system forms a dependency table by grouping the Q-times with similar dependencies together. The system identifies groups of the similar dependencies. The system extracts semiconductor process steps belonging to the groups.

    摘要翻译: 一种用于确定对各个半导体产品具有相似影响的一组半导体制造工艺步骤的系统。 该系统产生包括各个半导体产品的时间戳的第一表。 系统创建第二个表,其中包括基于第一个表的Q次。 Q时间是指每对时间戳之间的时差。 系统通过将Q次与相似的依赖关系分组在一起来形成依赖关系表。 系统识别类似依赖关系的组。 系统提取属于这些组的半导体工艺步骤。

    FOREIGN MATERIAL CONTAMINATION DETECTION
    7.
    发明申请
    FOREIGN MATERIAL CONTAMINATION DETECTION 有权
    外来物质污染检测

    公开(公告)号:US20110284029A1

    公开(公告)日:2011-11-24

    申请号:US12783702

    申请日:2010-05-20

    IPC分类号: B08B7/04

    摘要: There are provided a system, method and computer program product for detecting foreign materials in a semiconductor manufacturing process. The manufacturing process uses a plurality of semiconductor manufacturing tools. The system categorizes at least one monitoring wafer according to one or more categories. The system supplies the categorized monitoring wafer to a semiconductor manufacturing tool. The system observes a level of contamination on the categorized monitoring wafer. The system compares the level of contamination to a threshold. The system cleans the tool in a response to determining that the level of contamination is larger than the threshold. The system determines which category of the wafer leaves a highest level of contamination on the tool. The system identifies a root cause of the highest level of contamination on the tool.

    摘要翻译: 提供了一种用于在半导体制造工艺中检测异物的系统,方法和计算机程序产品。 制造工艺使用多个半导体制造工具。 该系统根据一个或多个类别对至少一个监视晶片进行分类。 该系统将分类的监控晶片提供给半导体制造工具。 该系统观察到分类监控晶片的污染程度。 系统将污染水平与阈值进行比较。 系统在响应中清洁工具以确定污染物的水平大于阈值。 该系统确定哪个类别的晶片在工具上留下最高的污染水平。 系统识别工具上最高污染水平的根本原因。

    METHOD FOR DETECTING HIGH IMPEDANCE FAULTS BY ANALYZING A LOCAL DEVIATION FROM A REGULARIZATION
    8.
    发明申请
    METHOD FOR DETECTING HIGH IMPEDANCE FAULTS BY ANALYZING A LOCAL DEVIATION FROM A REGULARIZATION 失效
    通过从定期分析本地偏差来检测高阻抗性故障的方法

    公开(公告)号:US20090204347A1

    公开(公告)日:2009-08-13

    申请号:US12028466

    申请日:2008-02-08

    IPC分类号: G06F17/18 G01R31/02

    CPC分类号: G01R31/024

    摘要: A method for detecting high impedance faults, including: receiving an input waveform from a circuit; computing a root mean square of the input waveform; fitting a regression line to the root mean squares; computing a deviation between the regression line and the root mean squares; determining whether the deviations are above a threshold; and outputting a value indicating that a fault has occurred in the circuit when the deviation is above the threshold and outputting a value indicating that a fault did not occur in the circuit when the deviation is below the threshold.

    摘要翻译: 一种用于检测高阻抗故障的方法,包括:从电路接收输入波形; 计算输入波形的均方根; 拟合回归线到均方根; 计算回归线与均方根的偏差; 确定偏差是否高于阈值; 并且当偏差高于阈值时输出指示电路中发生故障的值,并且当偏差低于阈值时输出指示电路中没有发生故障的值。