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公开(公告)号:US20100252530A1
公开(公告)日:2010-10-07
申请号:US12721903
申请日:2010-03-11
申请人: Robert Jeffrey Durante , Seung Jin Lee , Thomas Peter Tufano , Young Chul Park , Jun Woo Lee , Seung Yong Lee , Hyun Kyu Lee , Yu Jin Lee , Sang Hoon Jang
发明人: Robert Jeffrey Durante , Seung Jin Lee , Thomas Peter Tufano , Young Chul Park , Jun Woo Lee , Seung Yong Lee , Hyun Kyu Lee , Yu Jin Lee , Sang Hoon Jang
摘要: The present invention provides an etchant composition comprising A) high strength potassium monopersulfate providing from about 0.025% to about 0.8% by weight of active oxygen; B) from about 0.01% to about 30% by weight of the composition of B1) an organic acid, alkali metal salt of an organic acid, ammonium salt of an organic acid, or a homopolymer of an organic acid, or B2) a halogen or nitrate salt of phosphonium, tetrazolium, or benzolium, or B3) a mixture of component B1) and B2); and C) from about 0% to about 97.49% by weight of the composition of water; and a method of etching a substrate using said composition.
摘要翻译: 本发明提供一种蚀刻剂组合物,其包含A)高强度单硫酸钾,其提供约0.025重量%至约0.8重量%的活性氧; B)占组合物重量的约0.01%至约30%B1)有机酸,有机酸的碱金属盐,有机酸的铵盐或有机酸的均聚物,或B2)卤素 或鏻,四唑或苯并三唑的硝酸盐,或B3)组分B1)和B2的混合物); 和C)占组合物水重量的约0%至约97.49%; 以及使用所述组合物蚀刻衬底的方法。