Systems and methods for modifying wavefronts
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    发明申请
    Systems and methods for modifying wavefronts 有权
    修改波前的系统和方法

    公开(公告)号:US20050254112A1

    公开(公告)日:2005-11-17

    申请号:US10702708

    申请日:2003-11-06

    IPC分类号: G02B26/08 G02B27/00

    摘要: A system and method modifying wavefront shape is provided. Generally, the system contains a wavefront shape modifying device for modifying the shape of the wavefront. The system also contains a series of optical devices for returning the modified wavefront to the wavefront modifying device with an orientation that enables further modification of the modified wavefront by the wavefront modifying device. The method contains the steps of: reflecting a wavefront from a surface of a wavefront shape modifying device, resulting in the wavefront having a modified shape; and reflecting the wavefront having a modified shape from the surface of the wavefront shape modifying device a second time resulting in a final wavefront having a shape that has been modified twice.

    摘要翻译: 提供了修改波阵面形状的系统和方法。 通常,系统包含用于修改波前形状的波前形状修改设备。 该系统还包括一系列光学装置,用于将修改后的波前返回到波前修正装置,该方向具有能够由波前修改装置进一步修改修改的波前的方向。 该方法包括以下步骤:从波前形状修改设备的表面反射波前,导致波阵面具有修改的形状; 并且从波面形状修改装置的表面反射具有修改形状的波前,第二次导致具有已被修改两次的形状的最终波阵面。