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公开(公告)号：US5924845A
公开(公告)日：1999-07-20
申请号：US840109
申请日：1997-04-07
CPC分类号： F01D5/26 , Y02T50/671 , Y02T50/673 , Y10S416/50
摘要： A new apparatus and method for dynamically absorbing resonant vibration in jet engine blades and other rotating turbomachine components over all engine speeds is disclosed. A distributed pendulum (a pendulum having its axis of motion inside its body instead of at an end) is mounted inside a jet engine blade to function as a centrifugal pendulum. A centrifugal pendulum can be tuned so that its natural frequency linearly tracks the rotational speed of the engine or other turbomachine in which it is mounted and can absorb resonant vibrations from turbomachine components whenever the frequency of a source of vibratory excitation from a so-called speed line of the turbomachine coincides with a resonant frequency of the component. The equations of motion of a distributed pendulum are derived to show that a distributed pendulum small enough to fit inside a turbomachine component can be tuned to track a turbomachine speed line by adjusting its mass distribution about its axis of motion.
摘要翻译： 公开了一种用于在所有发动机速度下动态吸收喷气发动机叶片和其它旋转涡轮机组件中的共振振动的新装置和方法。 分布式摆锤（在其体内而不是端部具有其运动轴线的摆锤）安装在喷气发动机叶片内部，用作离心摆锤。 可以调节离心摆，使得其固有频率线性跟踪发动机或其它涡轮机的旋转速度，其中它安装在其中并且可以从涡轮机组件吸收共振振动，每当来自所谓速度的振动激励源的频率 涡轮机的线与部件的共振频率一致。 导出分布式摆的运动方程是为了表明小到足以装配在涡轮机组件内的分布式摆可以通过调整其在其运动轴线上的质量分布来跟踪涡轮机速度线。
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公开(公告)号：US5224504A
公开(公告)日：1993-07-06
申请号：US922578
申请日：1992-07-30
IPC分类号： H01L21/00 , H01L21/687
CPC分类号： H01L21/68785 , H01L21/67023 , Y10S134/902
摘要： A single wafer processor supports a semiconductor wafer having at least one surface that is to be subjected to contact with a fluid. The equipment includes a portable module including a gripper assembly that is rotatable about the axis of a portable housing and is capable of mechanically engaging or disengaging the edge of an individual wafer. The portable module is complementary to a receiving base having an open bowl provided with liquid jets for discharging processing liquids or reagents in parallel streams directed toward the outer surface of a rotating wafer. The bowl can also be filled with liquid for immersion treatment of a wafer, which can be held stationary or rotated at slow speeds. The portable unit is moved between base units by a robotic arm. All elements associated with holding of the wafer are physically shielded to minimize wafer contamination from environmental contact.
摘要翻译： 单个晶片处理器支持具有至少一个要与流体接触的表面的半导体晶片。 该设备包括便携式模块，其包括能够围绕便携式壳体的轴线旋转的夹持器组件，并且能够机械地接合或脱离单个晶片的边缘。 便携式模块与接收基座互补，该接收基座具有设置有液体射流的开口碗，用于排出指向旋转晶片的外表面的平行流中的处理液体或试剂。 碗也可以填充用于浸没处理晶片的液体，其可以保持静止或以低速旋转。 便携式单元通过机器臂在基座单元之间移动。 与保持晶片相关联的所有元件被物理屏蔽以最小化来自环境接触的晶片污染。
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公开(公告)号：US5911158A
公开(公告)日：1999-06-08
申请号：US808365
申请日：1997-02-28
CPC分类号： G01N29/2437 , G01L1/16 , G01L5/167 , G01L5/228 , G01M9/06 , G01N29/12 , G01N29/28 , G01N2291/014 , G01N2291/02827 , G01N2291/106
摘要： An apparatus and method for determining the dynamic response of a physical structure is disclosed. A single sheet of a piezoelectric polymer film, preferably polyvinylidene fluoride, or PVDF, is coated on one side with a thin layer of conductive material to serve as a ground electrode. The other side of the sheet is coated with a thin layer or conductive material in a non-contiguous pattern of individual electrodes defining an array of discrete piezoelectric transducers. Sensor leads are connected to each individual electrode and lead to a signal processor which includes associated software for determining from the processed electrical signals relative strain amplitudes of the surface area of a physical structure onto which the sheet is attached. The resulting output can be used to record strain time histories for later processing or, more simply, to show the time-averaged, steady state strain response of a structure.
摘要翻译： 公开了一种用于确定物理结构的动态响应的装置和方法。 单层压电聚合物膜，优选聚偏二氟乙烯或PVDF，在一侧涂覆有导电材料的薄层，以用作接地电极。 片材的另一面用限定一组离散压电换能器的单独电极的非连续图案中的薄层或导电材料涂覆。 传感器引线连接到每个单独的电极并且通向信号处理器，该信号处理器包括相关联的软件，用于根据经处理的电信号确定片材所附着的物理结构的表面积的相对应变幅度。 所得到的输出可用于记录应变时间历史以供稍后处理，或者更简单地显示结构的时间平均稳态应变响应。
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4.发明授权
公开(公告)号：US5230743A
公开(公告)日：1993-07-27
申请号：US922197
申请日：1992-07-30
IPC分类号： H01L21/00 , H01L21/687
CPC分类号： H01L21/68785 , H01L21/67023
摘要： A single wafer processor supports a semiconductor wafer having at least one surface that is to be subjected to contact with a fluid. The equipment includes a portable module including a gripper assembly that is rotatable about the axis of a portable housing and is capable of mechanically engaging or disengaging the edge of an individual wafer. The portable module is complementary to a receiving base having an open bowl provided with liquid jets for discharging processing liquids or reagents in parallel streams directed toward the outer surface of a rotating wafer. The bowl can also be filled with liquid for immersion treatment of a wafer, which can be held stationary or rotated at slow speeds. The portable unit is moved between base units by a robotic arm. All elements associated with holding of the wafer are physically shielded to minimize wafer contamination from environmental contact.
摘要翻译： 单个晶片处理器支持具有至少一个要与流体接触的表面的半导体晶片。 该设备包括便携式模块，其包括能够围绕便携式壳体的轴线旋转的夹持器组件，并且能够机械地接合或脱离单个晶片的边缘。 便携式模块与接收基座互补，该接收基座具有设置有液体射流的开口碗，用于排出指向旋转晶片的外表面的平行流中的处理液体或试剂。 碗也可以填充用于浸没处理晶片的液体，其可以保持静止或以低速旋转。 便携式单元通过机器臂在基座单元之间移动。 与保持晶片相关联的所有元件被物理屏蔽以最小化来自环境接触的晶片污染。
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公开(公告)号：US5168886A
公开(公告)日：1992-12-08
申请号：US328888
申请日：1989-03-27
IPC分类号： H01L21/00 , H01L21/687
CPC分类号： H01L21/68707 , H01L21/67023 , H01L21/68728 , Y10S134/902
摘要： A single wafer processor supports a semiconductor wafer having at least one surface that is to be subjected to contact with a fluid. The equipment includes a portable module including a gripper assembly that is rotatable about the axis of a portable housing and is capable of mechanically engaging or disengaging the edge of an individual wafer. The portable module is complementary to a receiving base having an open bowl provided with liquid jets for discharging processing liquids or reagents in parallel streams directed toward the outer surface of a rotating wafer. The bowl can also be filled with liquid for immersion treatment of a wafer, which can be held stationary or rotated at slow speeds. The portable unit is moved between base units by a robotic arm. All elements associated with holding of the wafer are physically shielded to minimize wafer contamination from environmental contact.
摘要翻译： 单个晶片处理器支持具有至少一个要与流体接触的表面的半导体晶片。 该设备包括便携式模块，其包括能够围绕便携式壳体的轴线旋转的夹持器组件，并且能够机械地接合或脱离单个晶片的边缘。 便携式模块与接收基座互补，该接收基座具有设置有液体射流的开口碗，用于排出指向旋转晶片的外表面的平行流中的处理液体或试剂。 碗也可以填充用于浸没处理晶片的液体，其可以保持静止或以低速旋转。 便携式单元通过机器臂在基座单元之间移动。 与保持晶片相关联的所有元件被物理屏蔽以最小化来自环境接触的晶片污染。
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