Furnace for the thermal treatment of a dental firing object
    1.
    发明申请
    Furnace for the thermal treatment of a dental firing object 审中-公开
    用于热处理牙科烧伤物体的炉子

    公开(公告)号:US20090246739A1

    公开(公告)日:2009-10-01

    申请号:US12383173

    申请日:2009-03-21

    摘要: A furnace for the thermal treatment of at least one dental firing object, comprising a housing, a firing chamber, a firing chamber base, a heating device, and at least one optical temperature detection element which can be used to detect a temperature in the firing chamber and is intended to enable a contactless temperature measurement of a dental firing object in a simple manner. This is achieved by virtue of the fact that the firing object is mounted on and/or in and/or below and/or alongside a firing aid situated in the firing chamber, and the optical temperature detection element detects the temperature of the firing aid.

    摘要翻译: 一种用于至少一个牙科烧伤物体的热处理的炉子,包括壳体,燃烧室,燃烧室底座,加热装置和至少一个可用于检测烧制温度的光学温度检测元件 旨在使得能够以简单的方式对牙科烧伤物体进行非接触式温度测量。 这是通过将点火物体安装在位于燃烧室中的击发辅助器上和/或之下和/或之下和/或之下,并且该光学温度检测元件检测燃烧辅助器件的温度来实现的。

    Apparatus for heating moldings, in particular dental ceramic molding
    3.
    发明申请
    Apparatus for heating moldings, in particular dental ceramic molding 审中-公开
    用于加热模制品的装置,特别是牙科陶瓷模制品

    公开(公告)号:US20100025394A1

    公开(公告)日:2010-02-04

    申请号:US12454588

    申请日:2009-05-20

    IPC分类号: H05B6/64

    摘要: The invention relates to an apparatus for heating moldings, in particular dental ceramic moldings, with the aid of microwaves or a magnetic field, the apparatus having a susceptor surrounding the molding, in particular according to the type of a container that is closed, said susceptor absorbing microwave radiation or being heated by a magnetic field and emitting heat to the molding. Further, a shielding for electrical and/or magnetic fields is arranged in the path between the microwave oven or the induction coil and the molding, in particular at the inner wall of the susceptor.

    摘要翻译: 本发明涉及一种借助于微波或磁场加热模制品,特别是牙科陶瓷模制品的装置,该装置具有包围模制件的基座,特别是根据关闭的容器的类型,所述基座 吸收微波辐射或被磁场加热并向模制品发射热量。 此外,电场和/或磁场的屏蔽被布置在微波炉或感应线圈和模制件之间的路径中,特别是在基座的内壁处。