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公开(公告)号:US20200339797A1
公开(公告)日:2020-10-29
申请号:US16851331
申请日:2020-04-17
Applicant: SABIC GLOBAL TECHNOLOGIES B.V.
Inventor: Peter VOLLENBERG , Christopher Luke HEIN , Hao ZHOU , Mark VAN DER MEE
Abstract: Thermoplastic compositions include: from about 62 wt % to about 99 wt % poly(methyl methacrylate) (PMMA) or copolymers thereof; and from about 1 wt % to about 38 wt % of a poly(carbonate-siloxane) copolymer having a siloxane content of from about 25 wt % to about 45 wt %. The compositions are scratch resistant. Scratch resistance may be determined as comprising a scratch depth of less than 20 micron (μm) as measured in accordance with the Erichsen scratch hardness test at a force of 4 Newton (N). Articles including the thermoplastic composition are also described.
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2.
公开(公告)号:US20200332180A1
公开(公告)日:2020-10-22
申请号:US16643129
申请日:2018-08-29
Applicant: SABIC GLOBAL TECHNOLOGIES B.V.
Inventor: Bing ZHOU , Jan Henk KAMPS , Christopher Luke HEIN , Manojkumar CHELLAMUTHU , Hao ZHOU , Adel Fawzy BASTAWROS , Pooja BAJAJ
Abstract: Disclosed is a quantum dot composition comprising: a polycarbonate resin, a polycarbonate copolymer resin, or a combination thereof; a quantum dot concentrate including a plurality of nanoparticle quantum dots and an acrylic polymer, a methacrylic polymer, or a combination thereof; and a compatibilizer for promoting dispersion of the nanoparticle quantum dots in the quantum dot composition. The compatibilizer includes a transesterification catalyst, a physical compatibilizer, a plurality of semiconductor nanopartides passivated with a metal oxide, or a combination thereof. Further disclosed is a method for making a quantum dot composition, the method including: forming a quantum dot concentrate by combining a plurality of nanoparticle quantum dots with an acrylic polymer, a methacrylic polymer or a combination thereof; and combining the quantum dot concentrate with a compatibilizer and a polycarbonate resin, a polycarbonate copolymer resin, or a combination thereof.
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