Method for obtaining a substrate coated with a functional layer by using a sacrificial layer

    公开(公告)号:US10882781B2

    公开(公告)日:2021-01-05

    申请号:US15316284

    申请日:2015-06-02

    Abstract: The invention relates to a process for obtaining a material comprising a substrate coated on at least one part of at least one of its faces with at least one functional layer, said process comprising: a step of depositing the or each functional layer, then a step of depositing a sacrificial layer on said at least one functional layer, then a step of heat treatment by means of radiation chosen from laser radiation or radiation from at least one flash lamp, said radiation having at least one treatment wavelength between 200 and 2500 nm, said sacrificial layer being in contact with the air during this heat treatment step, then a step of removing the sacrificial layer using a solvent, said sacrificial layer being a monolayer and being such that, before heat treatment, it absorbs at least one part of said radiation at said at least one treatment wavelength and that, after heat treatment, it is capable of being removed by dissolution and/or dispersion in said solvent.

    Glazing including a stack of thin layers

    公开(公告)号:US10961148B2

    公开(公告)日:2021-03-30

    申请号:US15758256

    申请日:2016-09-05

    Abstract: A material includes a transparent substrate coated with a stack of thin layers including a silver-based functional metal layer and two dielectric coatings, wherein a lower dielectric coating located below a silver-based functional layer includes a high-index layer based on metal oxide, an antidiffusion layer based on silicon and/or on aluminum, at least one oxide-based layer located above the antidiffusion layer and exhibiting a different composition from the antidiffusion layer, such as a smoothing layer and/or a wetting layer.

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