公开(公告)号：US20150176131A1

公开(公告)日：2015-06-25

申请号：US14642360

申请日：2015-03-09

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jong-Won Hong ,  Seok-Rak Chang ,  Chang-Mog JO ,  Young-Mook Choi ,  Jae-Kwang Ryu

IPC: C23C16/52 ,  C23C16/04

CPC classification number: C23C16/52 ,  C23C14/042 ,  C23C14/243 ,  C23C14/54 ,  C23C14/568 ,  C23C16/042 ,  H01L51/5253 ,  H01L51/56

Abstract: A thin film deposition apparatus includes: a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in the first direction; a position detection member that detects a relative position of the substrate to the patterning slit sheet; and an alignment control member that controls a relative position of the patterning slit sheet to the substrate by using the relative position of the substrate detected by the position detection member, wherein the thin film deposition apparatus and the substrate are separated from each other, and the thin film deposition apparatus and the substrate are moved relative to each other.

Abstract translation: 薄膜沉积设备包括：放电沉积材料的沉积源; 沉积源喷嘴单元，设置在沉积源的一侧，并且包括沿第一方向布置的多个沉积源喷嘴; 图案化缝隙片，与所述沉积源喷嘴单元相对设置并且包括沿所述第一方向布置的多个图案化狭缝; 位置检测构件，其检测所述基板与所述图案化缝隙片的相对位置; 以及对准控制部件，其通过使用由所述位置检测部件检测出的所述基板的相对位置来控制所述图案化狭缝片材与所述基板的相对位置，其中所述薄膜沉积设备和所述基板彼此分离， 薄膜沉积设备和基板相对于彼此移动。

公开(公告)号：US20140193581A1

公开(公告)日：2014-07-10

申请号：US14203212

申请日：2014-03-10

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Young-Mook CHOI ,  Chang-Mog JO ,  Hee-Cheol KANG ,  Hyun-Sook PARK

IPC: C23C16/52

CPC classification number: C23C16/52 ,  C23C14/042 ,  C23C14/12 ,  C23C14/243 ,  H01L51/0011 ,  H01L51/56

Abstract: A method for forming a thin film on a substrate includes discharging a deposition material from a deposition source through a plurality of deposition source nozzles arranged in a first direction on a deposition source nozzle unit disposed at a side of the deposition source; passing the deposition material through a patterning slit sheet; and depositing the deposition material on the substrate, while moving the substrate and the patterning slit sheet relative to each other. The patterning slit sheet is spaced apart from the substrate by a distance. A blocking member is disposed between the substrate and the deposition source and is moved along with the substrate to be positioned to screen at least one portion of the substrate, and the patterning slit sheet is disposed opposite to and spaced apart from the deposition source nozzle unit, and includes a plurality of patterning slits arranged in the first direction.

Abstract translation: 在基板上形成薄膜的方法包括通过在沉积源侧设置的沉积源喷嘴单元沿着第一方向布置的多个沉积源喷嘴从沉积源排出沉积材料; 使沉积材料通过图案化缝隙片; 以及在使衬底和图案化缝隙片相对于彼此移动的同时将沉积材料沉积在衬底上。 图案化缝隙片与衬底间隔一定距离。 阻挡构件设置在基板和沉积源之间并与基板一起移动以被定位以筛选基板的至少一部分，并且图案化缝隙片布置成与沉积源喷嘴单元相对并间隔开 并且包括沿第一方向布置的多个图案化狭缝。