公开(公告)号：US20130178023A1

公开(公告)日：2013-07-11

申请号：US13783083

申请日：2013-03-01

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Byeong-Jin LEE ,  Hong-Sik PARK ,  Sang-Tae KIM ,  Joon-Woo LEE ,  Young-Chul PARK ,  Young-Jun JIN ,  Suck-Jun LEE ,  Seung-Jae YANG ,  O-Byoung KWON ,  In-Ho YU ,  Sang-Hoon JANG ,  Min-Ki LIM ,  Hye-Ra SHIN ,  Yu-Jin LEE

IPC: H01L29/40

CPC classification number: H01L29/401 ,  C09K13/06 ,  H01L27/124 ,  H01L31/022475 ,  H01L31/022483 ,  H01L31/1884 ,  Y02E10/50

Abstract: An etchant composition for etching a transparent electrode is provided, the etchant composition includes an inorganic acid, an ammonium (NH4+)-containing compound, a cyclic amine compound, and the remaining amount of water.

Abstract translation: 提供了用于蚀刻透明电极的蚀刻剂组合物，蚀刻剂组合物包括无机酸，含铵（NH 4 +）的化合物，环胺化合物和剩余量的水。