公开(公告)号：US20220197133A1

公开(公告)日：2022-06-23

申请号：US17379339

申请日：2021-07-19

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jaehyuk Chang ,  Taejoon Kim ,  Hyunkyu Sun ,  Sikyung Lim

IPC: G03F1/70

Abstract: A method of managing a critical dimension error includes (i) defining, in a photomask, N openings having a width, where N is a natural number, (ii) using graphs for each of the N openings, each of the graphs being obtained by setting locations through an opening of the N openings as a first axis and an intensity of transmitting light as a second axis, obtaining ILSi proportional to an inclination of a tangent to a graph of the graphs at a location corresponding to an edge of an opening and Ii which is an intensity of transmitting light at the location, where i is a natural number from 1 to N, (iii) obtaining, with respect to each of the N openings, a real width CDi of the openings, and (iv) when I a ⁢ v ⁢ e = 1 N ⁢ ∑ i = 1 N ⁢ I i , CD a ⁢ v ⁢ e = 1 N ⁢ ∑ i = 1 N ⁢ CD i ⁢ ⁢ and ⁢ ⁢ ILS a ⁢ v ⁢ e = 1 N ⁢ ∑ i = 1 N ⁢ ILS i , obtaining AIMEEFi which is an aerial image mask error enhancement factor with respect to each of the N openings according to an equation below: AIMEEF i = - 2 ⁢ I i - I a ⁢ v ⁢ e ( C ⁢ D i - C ⁢ D a ⁢ v ⁢ e ) · ILS a ⁢ v ⁢ e · I a ⁢ v ⁢ e . [ Equation ]

公开(公告)号：US11934095B2

公开(公告)日：2024-03-19

申请号：US17379339

申请日：2021-07-19

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jaehyuk Chang ,  Taejoon Kim ,  Hyunkyu Sun ,  Sikyung Lim

IPC: G03F1/70

CPC classification number: G03F1/70

Abstract: A method of managing a critical dimension error includes (i) defining, in a photomask, N openings having a width, where N is a natural number, (ii) using graphs for each of the N openings, each of the graphs being obtained by setting locations through an opening of the N openings as a first axis and an intensity of transmitting light as a second axis, obtaining ILSi proportional to an inclination of a tangent to a graph of the graphs at a location corresponding to an edge of an opening and Ii which is an intensity of transmitting light at the location, where i is a natural number from 1 to N, (iii) obtaining, with respect to each of the N openings, a real width CDi of the openings, and (iv) when






I

a
⁢
v
⁢
e


=


1
N

⁢


∑

i
=
1

N

⁢

I
i




,


CD

a
⁢
v
⁢
e


=



1
N

⁢


∑

i
=
1

N

⁢


CD
i

⁢



⁢
and
⁢



⁢

ILS

a
⁢
v
⁢
e





=


1
N

⁢


∑

i
=
1

N

⁢

ILS
i





,




obtaining AIMEEFi which is an aerial image mask error enhancement factor with respect to each of the N openings according to an equation below:









AIMEEF
i

=


-
2

⁢




I
i

-

I

a
⁢
v
⁢
e





(


C
⁢

D
i


-

C
⁢

D

a
⁢
v
⁢
e




)

·

ILS

a
⁢
v
⁢
e


·

I

a
⁢
v
⁢
e




.






[
Equation
]