公开(公告)号：US20180019395A1

公开(公告)日：2018-01-18

申请号：US15429740

申请日：2017-02-10

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jae Wan PARK ,  Ju Eel MUN ,  Seung Ki KANG ,  In Hyun HWANG

IPC: H01L51/00 ,  C23C14/54 ,  H01L21/67 ,  C23C14/24 ,  H01L51/56 ,  H01L21/66

Abstract: A deposition apparatus includes a chamber, a first stage and a second stage for supporting substrates within the chamber, an evaporating source assembly moving a first stage area corresponding to the first stage and a second stage area corresponding to the second stage, and including a plurality of nozzles through which a source material is spurted, and a photographing assembly which is disposed between the first stage and the second stage and photographs the plurality of nozzles.