METHOD OF MANUFACTURING SILVER NANOWIRES
    1.
    发明申请
    METHOD OF MANUFACTURING SILVER NANOWIRES 有权
    制备银纳米粒子的方法

    公开(公告)号:US20150047468A1

    公开(公告)日:2015-02-19

    申请号:US14196576

    申请日:2014-03-04

    Abstract: A method of manufacturing silver nanowires includes: forming a first solution including a dispersion stabilizer and a polyol; forming a second solution including a dispersion stabilizer, a silver precursor, a halogen-ion donor, deionized water, and the polyol; forming a third solution by adding the second solution to the first solution; heating the third solution from a first temperature to a second temperature; and forming silver nanowires by maintaining the third solution at the second temperature.

    Abstract translation: 制造银纳米线的方法包括:形成包含分散稳定剂和多元醇的第一溶液; 形成包含分散稳定剂,银前体,卤素离子供体,去离子水和多元醇的第二溶液; 通过将第二溶液添加到第一溶液中形成第三溶液; 将第三溶液从第一温度加热到第二温度; 并通过将第三溶液保持在第二温度而形成银纳米线。

    DISPLAY PANEL
    2.
    发明公开
    DISPLAY PANEL 审中-公开

    公开(公告)号:US20230245624A1

    公开(公告)日:2023-08-03

    申请号:US18114161

    申请日:2023-02-24

    CPC classification number: G09G3/3275 G09G2300/0842 G09G2310/0272

    Abstract: A display device includes a driving voltage line and a plurality of data lines extending in a first direction, a first driving transistor electrically connected to the driving voltage line, a first switching transistor electrically connected to the first driving transistor and including a first switching semiconductor layer extending in a second direction crossing the first direction and a first switching gate electrode overlapping a channel region of the first switching semiconductor layer, and a first storage capacitor electrically connected to the first driving transistor and the first switching transistor, where the first switching semiconductor layer is electrically connected to a first data line, the first switching semiconductor layer crosses a second data line between the channel region and the first data line, and a crossing region of an edge of the first switching semiconductor layer and an edge of the second data line overlaps a first protection layer.

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