MASK AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME
    1.
    发明申请
    MASK AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME 有权
    使用其制造阵列基板的掩模和方法

    公开(公告)号:US20130230950A1

    公开(公告)日:2013-09-05

    申请号:US13865675

    申请日:2013-04-18

    Abstract: A mask includes: a substrate that includes a central area and a peripheral area disposed around the central area; and lenses disposed in rows and columns, in the central area and the peripheral area. The lenses of opposing sides of the peripheral area may be disposed in different rows or columns. For a given amount of input light, the lenses of the peripheral area may focus less light on a substrate than the lenses of the central area. The mask may be disposed over the substrate in different positions, and then the substrate may be irradiated through the mask, while the mask is in each of the positions. The peripheral portion of the mask may be disposed over the same area of the substrate, while the mask is in different ones of the positions.

    Abstract translation: 掩模包括:基板,其包括设置在中心区域周围的中心区域和周边区域; 以及设置在中央区域和周边区域中的行和列的透镜。 外围区域的相对侧面的透镜可以设置在不同的行或列中。 对于给定量的输入光,周边区域的透镜可以将较少的光聚焦在基底上,而不是中心区域的透镜。 掩模可以在不同位置上设置在衬底上,然后可以通过掩模照射衬底,同时掩模处于每个位置。 掩模的周边部分可以设置在基板的相同区域上,而掩模处于不同的位置。

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