APPARATUS FOR CLEANING A SUBSTRATE
    1.
    发明申请
    APPARATUS FOR CLEANING A SUBSTRATE 审中-公开
    用于清洁基板的装置

    公开(公告)号:US20150129000A1

    公开(公告)日:2015-05-14

    申请号:US14463848

    申请日:2014-08-20

    Abstract: An apparatus for cleaning a substrate includes a substrate transferring unit configured to support a substrate at a polar angle from a first direction, and transfer the substrate along a second direction orthogonal to the first direction. A cleaning unit is disposed on the substrate transferring unit. The cleaning unit includes a plurality of two-fluid nozzles. The cleaning unit has an azimuth angle from the first direction. The two-fluid nozzles mix a cleaning solution and compressed gas together and spray the mixture.

    Abstract translation: 一种用于清洗基板的设备包括:基板传送单元,被配置为从第一方向以极角支撑基板,并沿着与第一方向正交的第二方向传送基板。 清洁单元设置在基板传送单元上。 清洁单元包括多个双流体喷嘴。 清洁单元具有从第一方向的方位角。 双流体喷嘴将清洁溶液和压缩气体混合在一起并喷雾混合物。

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