INTEGRATED CIRCUIT DEVICE
    1.
    发明公开

    公开(公告)号:US20240030283A1

    公开(公告)日:2024-01-25

    申请号:US18224745

    申请日:2023-07-21

    Abstract: An integrated circuit device includes: a fin-type active region protruding from a substrate and extending in a first lateral direction, wherein the fin-type active region includes a first sub-fin-type active region, a second sub-fin-type active region, and a third sub-fin-type active region that is disposed between the first sub-fin-type active region and the second sub-fin-type active region; a first gate line extending in a second lateral direction on the first sub-fin-type active region, wherein the second lateral direction intersects with the first lateral direction; a second gate line extending in the second lateral direction on the second sub-fin-type active region; a diffusion break structure passing through a portion of the third sub-fin-type active region in a vertical direction, wherein the diffusion break structure has a groove portion in an upper portion thereof; and a crack filler filling the groove portion.

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