TEMPERATURE CONTROL SYSTEM AND TEMPERATURE CONTROL METHOD FOR SEMICONDUCTOR MANUFACTURING DEVICE

    公开(公告)号:US20240192712A1

    公开(公告)日:2024-06-13

    申请号:US18468613

    申请日:2023-09-15

    CPC classification number: G05D23/1931 H01L21/6833

    Abstract: A temperature control system of a semiconductor manufacturing device includes first and second heating media storages that respectively store low-temperature heating media and high-temperature heating media, a mixing device including a mixing valve that mixes the low-temperature heating media and the high-temperature heating media at a predetermined mixing ratio, and a control device. The mixing device provides mixed heating media to a load, and distributes recovered heating media recovered from the load to the first and second heating media storages. The control device is configured to, by performing feed-forward control and feedback control over a mixing unit temperature using a relationship model between a reference temperature representing a temperature of heating media passing through the load and the mixing unit temperature which is a temperature of heating media output by the mixing valve, control the mixing ratio such that the reference temperature has a target reference temperature.

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