CHEMICAL LIQUID SUPPLY APPARATUS, AND SUBSTRATE TREATING APPARATUS HAVING THE SAME

    公开(公告)号:US20250105032A1

    公开(公告)日:2025-03-27

    申请号:US18442548

    申请日:2024-02-15

    Abstract: A chemical liquid supply apparatus is provided and includes an additive supply, a chemical liquid supply, and a controller that controls the additive supply and the chemical liquid supply. The additive supply includes a first tank that receives an additive from an additive container, and a first circulating pipe connected to the first tank. The chemical liquid supply includes an auxiliary tank that receives an etching liquid from another container and receives the additive, and a second circulating pipe connected to the auxiliary tank. The controller provides control so as to: circulate the additive in the first tank; heat the etching liquid in the auxiliary tank using a heater such that a temperature of the etching liquid is increased to a first temperature; supply the additive to the auxiliary tank; and produce a chemical liquid by circulating the etching liquid and the additive at the first temperature.

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