公开(公告)号：US20130192648A1

公开(公告)日：2013-08-01

申请号：US13755367

申请日：2013-01-31

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hyun Ho CHO ,  Donghyun KIM ,  Dongyeon KIM ,  Yohan AHN ,  Kunhyung LEE

IPC: B08B9/093

CPC classification number: B08B9/093 ,  B08B9/08 ,  C23C16/4405 ,  C23C16/4412

Abstract: A method of removing a reaction gas remaining in a process chamber after a process of treating a substrate in the process chamber is completed includes exhausting the reaction gas remaining in the process chamber to a region outside of the process chamber through an exhaust line, and supplying a cleaning gas into the process chamber through a gas supplying line. The cleaning gas is different from the reaction gas

Abstract translation: 在处理室中处理基板的处理过程之后，除去残留在处理室中的反应气体的方法包括通过排气管将残留在处理室中的反应气体排出到处理室外部的区域，并供给 通过气体供应管线将清洁气体进入处理室。 清洗气体与反应气体不同