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公开(公告)号:US20170207263A1
公开(公告)日:2017-07-20
申请号:US15408085
申请日:2017-01-17
Applicant: Samsung Electronics Co., Ltd .
Inventor: Donghyuk Park , SEUNGWON CHA , Cheolju KANG , YITAE KIM , JONGEUN PARK , JUNGCHAK AHN , Yujung CHOI
IPC: H01L27/146
CPC classification number: H01L27/14614 , H01L27/14621 , H01L27/14627 , H01L27/1464
Abstract: An image sensor and a method of fabricating the same are disclosed. The image sensor may include a substrate including an active region defined by a device isolation layer, a photoelectric conversion layer, a well impurity layer, a floating diffusion region, and a transfer gate. When viewed in a plan view, a lower portion of the transfer gate may include a first surface in contact with the device isolation layer, a second surface substantially perpendicular to the first surface, and a third surface connected to the first and second surfaces. The third surface may face the floating diffusion region. A first portion of a gate insulating layer may be adjacent to the third surface and thinner than a portion adjacent to the first surface or the second surface, and this may facilitate more efficient transfer of an electron from the photoelectric conversion layer to the floating diffusion region.
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公开(公告)号:US20170207267A1
公开(公告)日:2017-07-20
申请号:US15410859
申请日:2017-01-20
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: DONGHYUK PARK , SEUNGWON CHA , CHEOLJU KANG , YITAE KIM , JONGEUN PARK , JUNGCHAK AHN , YUJUNG CHOI
IPC: H01L27/146
CPC classification number: H01L27/14623 , H01L27/14621 , H01L27/14627 , H01L27/1463 , H01L27/14636 , H01L27/14645 , H01L27/14685 , H01L27/14689 , H04N5/374 , H04N5/378 , H04N9/045
Abstract: An image sensor is provided. The image sensor includes a light shielding layer having a grid structure corresponding to a device isolation layer defining a plurality of pixel regions. The light shielding layer includes holes exposing the plurality of pixel regions, respectively. The light shielding layer is connected to a charge pump applying a negative voltage.
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