公开(公告)号：US10748749B1

公开(公告)日：2020-08-18

申请号：US16668825

申请日：2019-10-30

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jeong Il Mun ,  Kyeong Hun Kim ,  See Yub Yang ,  Hyung Joo Lee ,  Jong Woo Sun

IPC: H01J37/32 ,  G01N21/00 ,  G01N21/68 ,  G01N21/62

Abstract: A plasma monitoring apparatus includes a reflective structure disposed on a processing chamber providing a space in which plasma for processing a substrate is formed, the reflective structure configured to receive fragments of light incident in a plurality of incident directions from the plasma, and output the fragments of light in a plurality of exit directions by reflecting the fragments of light within the reflective structure; at least one light sensor configured to receive the fragments of light passing through the reflective structure in the plurality of exit directions; and at least one optical spectrometer connected to the at least one light sensor.