IMAGE SENSOR AND SEMICONDUCTOR DEVICE HAVING A METAL OXIDE SEMICONDUCTOR LAYER DOPED WITH NITROGEN, AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20220384502A1

    公开(公告)日:2022-12-01

    申请号:US17575874

    申请日:2022-01-14

    Abstract: An image sensor includes a substrate including a plurality of pixels and having a first surface and a second surface opposite to the first surface, a photoelectric conversion portion disposed in the substrate in each of the pixels, a transfer gate disposed on the first surface of the substrate in each of the pixels, a first interlayer insulating layer covering the substrate and the transfer gate, a first hydrogen blocking layer disposed on the first interlayer insulating layer, a first active pattern disposed on the first hydrogen blocking layer and including a metal oxide doped with nitrogen, a first gate disposed on the first active pattern, a second interlayer insulating layer covering the first gate and the first active pattern, and upper source/drain contacts penetrating the second interlayer insulating layer and contacting the first active pattern at two sides of the first gate.

Patent Agency Ranking