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公开(公告)号：US20220283489A1
公开(公告)日：2022-09-08
申请号：US17501085
申请日：2021-10-14
Applicant: SAMSUNG ELECTRONICS CO.,LTD.
Inventor： SANG UK PARK , Jong Ju Park , Jong Keun Oh
Abstract: A reflective photomask includes a pattern area, a non-pattern area at least partially surrounding the pattern area, and a black border area interposed between the pattern area and the non-pattern area. The reflective photomask includes a mask substrate, a reflector layer stacked on the mask substrate, and an absorber layer stacked on the reflector layer. The black border area includes a plurality of first anneal patterns which are arranged along an edge of the pattern area and each have an island shape, and a second anneal pattern which fills inside of the black border area and has a line shape.
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