公开(公告)号：US20250068076A1

公开(公告)日：2025-02-27

申请号：US18776047

申请日：2024-07-17

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Seongjin KIM ,  Jaeyeol BAEK ,  Soonhyung KWON ,  Byeonggyu HWANG ,  Hwayoung JIN ,  Eunsu LEE ,  Ahra CHO ,  Yoojeong CHOI ,  Sungwoo JUNG

IPC: G03F7/11 ,  C08G73/06 ,  C09D179/04

Abstract: Disclosed are a resist underlayer composition, and a method of forming a pattern using the resist underlayer composition. The resist underlayer composition includes a polymer including a structural unit represented by Chemical Formula 1, and a solvent. The definitions of Chemical Formula 1 are as described in the specification.

公开(公告)号：US20250130493A1

公开(公告)日：2025-04-24

申请号：US18918816

申请日：2024-10-17

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Eunsu LEE ,  Jaeyeol BAEK ,  Byeonggyu HWANG ,  Hwayoung JIN ,  Soojeung KIM ,  Seongjin KIM ,  Ahra CHO ,  Yoojeong CHOI ,  Sungwoo JUNG ,  Changmo LIM ,  Soonhyung KWON

IPC: G03F7/038 ,  C08F226/06 ,  G03F7/16

Abstract: Disclosed are a resist underlayer composition, and a method of forming a pattern using the resist underlayer composition. The resist underlayer composition includes a polymer including a structural unit represented by Chemical Formula 1, a structural unit represented by Chemical Formula 2, a structural unit represented by Chemical Formula 3, or a combination thereof, a compound represented by one or more selected from Chemical Formula 4 to Chemical Formula 6, and a solvent. The definitions of Chemical Formula 1 to Chemical Formula 6 are as described in the specification.

公开(公告)号：US20250093777A1

公开(公告)日：2025-03-20

申请号：US18890487

申请日：2024-09-19

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Byeonggyu HWANG ,  Changmo LIM ,  Jaeyeol BAEK ,  Soonhyung KWON ,  Hwayoung JIN ,  Soojeung KIM ,  Eunsu LEE ,  Seongjin KIM ,  Ahra CHO ,  Yoojeong CHOI ,  Sungwoo JUNG

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038

Abstract: Disclosed are a resist underlayer composition, and a method of forming a pattern using the resist underlayer composition. the resist underlayer composition includes a polymer including a structural unit represented by Chemical Formula 1, a structural unit represented by Chemical Formula 2, a structural unit represented by Chemical Formula 3, or a combination thereof and a solvent. The definitions of Chemical Formula 1 to Chemical Formula 3 are as described in the specification.