公开(公告)号：US20220162179A1

公开(公告)日：2022-05-26

申请号：US17440360

申请日：2020-03-20

申请人： SAMYANG CORPORATION ,  RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY

发明人： Chun Rim OH ,  Deuk Rak LEE ,  Won Jung LEE ,  Chi Wan LEE ,  Ji Eun CHOI ,  Young Sug KIM ,  Jung Woon YANG ,  Tae Woo LEE

IPC分类号： C07D307/68

摘要： The present invention relates to a method for the synthesis of 2,5-furandicarboxylic acid, and more specifically, the present invention relates to a more efficient and economical method capable of preparing 2,5-furandicarboxylic acid having various functions with high purity and high yield, even without using a transition metal catalyst.

公开(公告)号：US20240085786A1

公开(公告)日：2024-03-14

申请号：US18269780

申请日：2021-12-28

申请人： SAMYANG CORPORATION

发明人： Chun Rim OH ,  Dae Hyuk CHOI ,  Yu Na CHOI ,  Deuk Rak LEE ,  Ji Eun CHOI ,  Ki Tae KANG ,  Min Jung KIM ,  Won Jung LEE ,  Chi Wan LEE

IPC分类号： G03F7/004 ,  C07D221/14

CPC分类号： G03F7/0045 ,  C07D221/14

摘要： The present invention relates to a naphthalimide sulfonate derivative, and a photoacid generator and a photoresist composition each comprising same and, more specifically, to a naphthalimide sulfonate derivative compound, and a photoacid generator and a photoresist composition each comprising same, wherein the compound has excellent absorbance for light of i-line (365 nm) wavelength, is greatly easy to prepare into a polymerizable composition due to very high solubility in an organic solvent, has good thermal stability, and shows a favorable acid generation rate.

公开(公告)号：US20230331680A1

公开(公告)日：2023-10-19

申请号：US18028878

申请日：2021-09-29

申请人： SAMYANG CORPORATION

发明人： Chun Rim OH ,  Dae Hyuk CHOI ,  Min Jung KIM ,  Deuk Rak LEE ,  Won Jung LEE ,  Yu Na CHOI ,  Ji Eun CHOI

IPC分类号： C07D221/14 ,  G03F7/004

CPC分类号： C07D221/14 ,  G03F7/0045

摘要： The present invention relates to a naphthalimide sulfonate derivative, and a photoacid generator and a photoresist composition which comprise same, and, more specifically, to a naphthalimide sulfonate derivative compound, and a photoacid generator and a photoresist composition which comprise same, the compound having an excellent absorbance of light with an i-line wavelength (365 nm), having a high solubility in an organic solvent, having excellent thermal stability, and exhibiting a good acid generation rate.