摘要:
A chemically amplified resist composition is provided which is excellent in LWR and resolution and can prevent a resist pattern from collapsing in far ultraviolet lithography and EUV lithography, an onium salt for use therein, and a pattern forming process using the resist composition. The chemically amplified resist composition includes an onium salt having the following formula (1).
摘要:
The present invention relates to a naphthalimide sulfonate derivative, and a photoacid generator and a photoresist composition each comprising same and, more specifically, to a naphthalimide sulfonate derivative compound, and a photoacid generator and a photoresist composition each comprising same, wherein the compound has excellent absorbance for light of i-line (365 nm) wavelength, is greatly easy to prepare into a polymerizable composition due to very high solubility in an organic solvent, has good thermal stability, and shows a favorable acid generation rate.
摘要:
The present invention provides two-dimensional polymers P1 and P2 of pyromellitic diimide and hexaamino benzene and derivatives thereof, from monomer of Formula (M), which are used to synthesize composites for supercapacitor applications. M
摘要:
Provided is a fused ring diimide derivative having a chemical structure of formula I. Further provided is a preparation method therefor. The fused ring diimide derivative has excellent anti-tumor activity, and the anti-proliferative activity on various cancer cells is significantly better than that of similar compounds.
摘要:
A thermal acid generator having a high acid generation temperature, and a resist composition using the same. The thermal acid generator is a sulfonic acid derivative compound represented by the following Formula (I): (wherein, R1 represents an aliphatic hydrocarbon group having 1 to 18 carbon atoms or the like, or a group represented by the following Formula (II): (wherein, Y1 represents a single bond or an alkanediyl group having 1 to 4 carbon atoms; R11 and R12 each independently represent an alkanediyl group having 2 to 6 carbon atoms, or the like; R13 represents a linear or branched alkyl group having 1 to 18 carbon atoms, or the like; a and b each represent 0 or 1; and either a or b is 1); R2 to R7 each independently represent a linear or branched alkyl group having 1 to 14 carbon atoms; the aliphatic hydrocarbon group or the like of R1 has no substituent or is substituted with a halogen atom or the like; and a methylene structure in the aliphatic hydrocarbon group or the like of R1 is optionally substituted with —O— or the like).
摘要:
Provide are: a sulfonic acid derivative compound which has high absorbance for light having a wavelength of 365 nm and exhibits high solubility in organic solvents and good acid generation rate; a photoacid generator; a resist composition; a cationic polymerization initiator; and a cationically polymerizable composition. The sulfonic acid derivative compound is represented by the following Formula (I): (wherein, X represents a linear or branched alkyl group having 1 to 14 carbon atoms; and R represents an aliphatic hydrocarbon group having 1 to 18 carbon atoms, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, an acyl group-substituted aryl group having 7 to 20 carbon atoms, an alicyclic hydrocarbon group having 3 to 12 carbon atoms, a 10-camphoryl group or the like).
摘要:
A pseudo-esterase activity-based fluorescent probe for specific detection of albumin, which has a carboxylic ester bond that can be selectively cleaved by human serum albumin (HSA), therefore forming a hydrolysate, which has a fluorescence emission spectrum significantly different from that of the fluorescent probe. According to the fluorescence intensity of the fluorescent probe and hydrolysate, we can detect the content of HSA in a biological sample.
摘要:
Disclosed herein is a compound for use in a composition applied to a blood vessel, wherein the compound softens and/or disrupts the crystalline matrix of calcified plaque. Methods of treatment comprising applying the disclosed composition are also disclosed. Plaque-softening compounds are also disclosed.