Artifact Management Infrastructure
    1.
    发明公开

    公开(公告)号:US20240345822A1

    公开(公告)日:2024-10-17

    申请号:US18301678

    申请日:2023-04-17

    Applicant: SAP SE

    CPC classification number: G06F8/65 G06F8/63

    Abstract: A method, a system, and computer program product for managing container artifacts are provided. An artifact including a container image is received. Validation rules for performing a validation of the artifact are retrieved. Metadata is extracted from the artifact for performing the validation of the artifact. Validation of the artifact is performed by processing the container image using the validation rules and the metadata. The metadata of the artifact is stored, at a database of a registry, for the metadata to be accessible for updates over a lifetime of the artifact.

    Methods and systems for managing configuration settings

    公开(公告)号:US09875273B2

    公开(公告)日:2018-01-23

    申请号:US14169926

    申请日:2014-01-31

    Applicant: SAP SE

    CPC classification number: G06F17/30386 G06F17/30312

    Abstract: A method for receiving configuration data for a client from a data repository may include sending a request for information pertaining to data stored in the data repository and receiving the data repository information. The method may include identifying a settings repository from the data repository information and requesting configuration data for the client from the identified settings repository. The configuration data may be received from the data repository and stored at the client. The settings at the client may be applied based on the received configuration data.

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