Photoresist recirculation and viscosity control for dip coating applications
    1.
    发明申请
    Photoresist recirculation and viscosity control for dip coating applications 审中-公开
    用于浸涂应用的光阻再循环和粘度控制

    公开(公告)号:US20040209000A1

    公开(公告)日:2004-10-21

    申请号:US10842472

    申请日:2004-05-11

    CPC classification number: H01L21/6715 B05C3/04 B05C3/09 G03F7/16

    Abstract: A method of performing dip coating of a layer of a resist material on a surface of a substrate, comprising steps of: (a) providing a dip coating vessel having an interior space containing a dip coating liquid comprising a solution of the resist material in a solvent, the dip coating vessel being open at the top thereof; (b) providing a substrate having a surface, immersing the substrate in the dip coating liquid in the vessel via the open top, and withdrawing the substrate from the vessel via the open top thereof, thereby forming a layer of resist material on the surface; and (c) monitoring and maintaining the viscosity of the dip coating liquid supplied to the dip coating vessel at a predetermined value. Also disclosed is an apparatus for performing the method.

    Abstract translation: 一种在衬底的表面上进行抗蚀剂材料层的浸涂的方法,包括以下步骤:(a)提供一种浸渍涂布容器,该浸渍涂布容器具有内部空间,该内部空间含有包含抗蚀剂材料溶液的浸涂液 溶剂,浸涂装置在其顶部开口; (b)提供具有表面的基材,经由开口顶部将基材浸渍在容器中的浸渍涂布液中,并通过其开口顶部将容器从容器中取出,从而在表面上形成抗蚀剂材料层; 和(c)以预定值监测和维持供应到浸涂机的浸涂液的粘度。 还公开了一种用于执行该方法的装置。

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