公开(公告)号：US10957517B2

公开(公告)日：2021-03-23

申请号：US16695386

申请日：2019-11-26

Applicant: SEMES CO., LTD.

Inventor： Yunsik Ju ,  Sangbo Seo ,  Byeong Hyeon Kong

IPC: H01J37/32

Abstract: Disclosed is a substrate treating apparatus including a chamber having a process space therein in which a substrate is treated, a substrate support assembly located in the chamber and including a support plate that supports the substrate, a gas supply unit that supplies gas into the chamber, a gas distribution plate that distributes the gas and supplies the gas into the process space, and a temperature control unit that controls temperature of the gas distribution plate. The temperature control unit includes a heating member that heats the gas distribution plate, a cooling member that cools the gas distribution plate, and a control member that controls the heating member and the cooling member, based on a correlation coefficient regarding an interaction of the heating member and the cooling member and a disturbance coefficient regarding an external influence.

公开(公告)号：US20200176224A1

公开(公告)日：2020-06-04

申请号：US16695386

申请日：2019-11-26

Applicant: SEMES CO., LTD.

Inventor： Yunsik Ju ,  Sangbo Seo ,  Byeong Hyeon Kong

IPC: H01J37/32

Abstract: Disclosed is a substrate treating apparatus including a chamber having a process space therein in which a substrate is treated, a substrate support assembly located in the chamber and including a support plate that supports the substrate, a gas supply unit that supplies gas into the chamber, a gas distribution plate that distributes the gas and supplies the gas into the process space, and a temperature control unit that controls temperature of the gas distribution plate. The temperature control unit includes a heating member that heats the gas distribution plate, a cooling member that cools the gas distribution plate, and a control member that controls the heating member and the cooling member, based on a correlation coefficient regarding an interaction of the heating member and the cooling member and a disturbance coefficient regarding an external influence.