公开(公告)号：US20220203412A1

公开(公告)日：2022-06-30

申请号：US17404314

申请日：2021-08-17

Applicant: SEMES CO., LTD.

Inventor： Dogyeong Ha ,  Jaehyeok Yu ,  Gunmin Lee ,  Moonsoon Choi ,  Chaeyoung Lim

IPC: B08B3/14 ,  B08B3/02

Abstract: An apparatus for processing a substrate may include a process chamber providing a processing space in which a predetermined process is performed on a substrate and a chemical liquid supply device for supplying a chemical liquid onto the substrate dispose din the process chamber. The chemical liquid supply device may include a chemical liquid supply reservoir for storing the chemical liquid, a chemical liquid supply line for providing a path through which the chemical liquid is supplied from the chemical liquid reservoir onto the substrate, at least one heating member for heating the chemical liquid provided from the chemical liquid reservoir, a sensing member including a first sensor for measuring a temperature of the chemical liquid entering the at least one heating member and a second sensor for measuring a temperature of the chemical liquid exiting the at least one heating member, and a control member for controlling an operation of the at least one heating member based on a difference between the temperatures measured by the first and the second sensors.