公开(公告)号：US10796891B2

公开(公告)日：2020-10-06

申请号：US16161180

申请日：2018-10-16

Applicant: SEMES CO., LTD.

Inventor： Seon Do Kim ,  Hyung Joon Kim

IPC: H01J37/32

Abstract: Disclosed is a substrate processing apparatus including a chamber having a processing space inside, a support unit that supports a substrate in the processing space, a gas supply unit that supplies gas into the processing space, a plasma source that generates plasma from the gas supplied into the processing space, and a detection unit that is provided in a sidewall of the chamber and that measures an impedance change to detect a degree of adsorption of particles on an inner wall of the chamber or a surface of a part that is exposed to the processing space.