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1.发明公开公开(公告)号：US20230407179A1
公开(公告)日：2023-12-21
申请号：US18336070
申请日：2023-06-16
Applicant: SEMES CO., LTD.
Inventor： Kyungseok MIN , Sukjune AN , Donggung SHIN
IPC: C09K13/12
CPC classification number: C09K13/12
Abstract: An etching gas composition includes at least two C3 or C4 organic fluorine compounds and niobium fluoride, and the at least two C3 or C4 organic fluorine compounds are isomers.
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