公开(公告)号：US20220172927A1

公开(公告)日：2022-06-02

申请号：US17532082

申请日：2021-11-22

Applicant: SEMES Co., Ltd.

Inventor： Goon Ho Park ,  Jung Mo Gu ,  Ja Myung Gu ,  Hyun Jin Kim

IPC: H01J37/32

Abstract: Provided are an apparatus for multi-level pulsing, which minimizes power reflection when generating plasma using an RF signal having a plurality of pulsing levels, and a substrate processing apparatus including the same. The apparatus includes an RF signal generator for generating an RF signal including a first pulsing level and a second pulsing level that are different from each other, and a matching network for receiving the RF signal and providing a corresponding output signal to a load, wherein the RF signal generator generates the RF signal so that a first target impedance of the first pulsing level and a second target impedance of the second pulsing level are different from each other.

公开(公告)号：US12087547B2

公开(公告)日：2024-09-10

申请号：US17532082

申请日：2021-11-22

Applicant: SEMES Co., Ltd.

Inventor： Goon Ho Park ,  Jung Mo Gu ,  Ja Myung Gu ,  Hyun Jin Kim

IPC: H01J37/32

CPC classification number: H01J37/32183 ,  H01J37/32146 ,  H01J37/3244

Abstract: Provided are an apparatus for multi-level pulsing, which minimizes power reflection when generating plasma using an RF signal having a plurality of pulsing levels, and a substrate processing apparatus including the same. The apparatus includes an RF signal generator for generating an RF signal including a first pulsing level and a second pulsing level that are different from each other, and a matching network for receiving the RF signal and providing a corresponding output signal to a load, wherein the RF signal generator generates the RF signal so that a first target impedance of the first pulsing level and a second target impedance of the second pulsing level are different from each other.