METHOD FOR PRODUCING SUBSTRATE FOR MILLIMETER WAVE

    公开(公告)号:US20230294389A1

    公开(公告)日:2023-09-21

    申请号:US18184831

    申请日:2023-03-16

    CPC classification number: B32B37/24 B32B7/12 B32B15/043 H01Q1/38

    Abstract: A method for producing a substrate for millimeter wave comprises the steps of: (a) mixing ceramic powder and Teflon powder; (b) dispersing the mixed ceramic powder and Teflon powder in a dispersion equipment; (c) after the step of (b) dispersing is completed, outputting a paste of a mixture of the ceramic powder and the Teflon powder by additionally adding a solution and a binder to the dispersion equipment and then dispersing the mixture; (d) applying the paste to a first metal thin film; (e) drying the first metal thin film to which the paste is applied; and (f) laminating a second metal thin film on the opposite side of the paste bonded to the dried first metal thin film and then thermally bonding it.

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