公开(公告)号：US09760022B2

公开(公告)日：2017-09-12

申请号：US15122019

申请日：2015-02-12

申请人： SHANGHAI MICRO ELECTRONICS EQUIPMENT CO., LTD.

发明人： Feihong Liao ,  Yuebin Zhu ,  Haili Jia ,  Shuping Hu

IPC分类号： G03B27/58 ,  G03F7/20

CPC分类号： G03F7/70725 ,  G03F7/70758 ,  G03F7/70775 ,  G03F7/70816

摘要： A fine-motion module for use in a wafer stage of a photolithography tool includes: a base (201); a fine-motion plate (210); a plurality of vertical motors (203), fixed between the base and the fine-motion plate; a plurality of gravity compensators (202), each having one end fixed on the base and the other end configured to support the fine-motion plate; a plurality of absolute-position sensors (205, 211), configured to measure an absolute position of the fine-motion plate and to adjust pressures in the gravity compensators based on the obtained absolute-position measurements such that the absolute position of the fine-motion plate is changed to a predetermined initial vertical position; and a plurality of relative-position sensors (204, 207), configured to measure a relative position of the fine-motion plate to the base and to control the fine-motion plate based on the obtained relative-position measurements, thereby moving the fine-motion plate to a relative zero position.