公开(公告)号：US20150361378A1

公开(公告)日：2015-12-17

申请号：US14764199

申请日：2014-01-27

Applicant: SHARP KABUSHIKI KAISHA

Inventor： Kyohko MATSUURA ,  Yuhsuke TSUDA ,  Hidetsugu MATSUKIYO ,  Yuka UTSUMI ,  Akiyoshi FUJII ,  Takahiro NAKAHARA ,  Kiyoshi MINOURA ,  Miho YAMADA

IPC: C11D3/00 ,  C11D3/06 ,  C11D1/66 ,  C11D3/30 ,  B08B3/04 ,  C11D3/10

CPC classification number: C11D3/0047 ,  B08B1/006 ,  B08B3/04 ,  C11D1/66 ,  C11D3/06 ,  C11D3/10 ,  C11D3/30 ,  C11D17/041 ,  C11D17/049 ,  G02B1/118

Abstract: A cleaning solution is used, in a transparent antireflective structure that has, on one surface thereof, a plurality of convexities formed at a period equal to or shorter than wavelength in a visible light range, and that prevents, at the one surface, reflection of light entering the one surface, to clean a concavity defining a region between adjacent two of the plural convexities, the cleaning solution having a pH of 10.00 or more.

Abstract translation: 在透明抗反射结构中使用清洁溶液，其在其一个表面上具有在可见光范围内等于或短于波长的时间处形成的多个凸部，并且在一个表面上防止 进入一个表面的光，以清洁限定多个凸部的相邻两个之间的区域的凹部，该清洁溶液的pH为10.00以上。