公开(公告)号：US20020134753A1

公开(公告)日：2002-09-26

申请号：US10152001

申请日：2002-05-22

Applicant: SHIBAURA MECHATRONICS CORPORATION

Inventor： Masaru Kasai

IPC: B44C001/22 ,  C23F001/00

CPC classification number: H01L21/30

Abstract: A vacuum processing apparatus produces fluorine radicals by activating a fluorinating gas containing at least fluorine atoms and fluorinates the surface of a component formed of an organic material (32) exposed to an atmosphere of a processing chamber (2) before carrying an object (S) into the processing chamber (2). The object (S) is carried into the processing chamber (2) after the completion of a fluorinating process. The object (S) is processed with a processing gas containing at least oxygen radicals. Etching of the component formed of the organic material (32) can be prevented by the fluorination of surface of the component formed of the organic material (32) and exposed to an atmosphere in the processing chamber (2).