公开(公告)号：US20150297470A1

公开(公告)日：2015-10-22

申请号：US14434976

申请日：2013-10-11

Applicant: SHISEIDO COMPANY, LTD.

Inventor： Tomoko KIMURA ,  Naomi KANNO ,  Satoshi YAMAKI

IPC: A61K8/02 ,  A61Q19/00 ,  A61Q1/14 ,  A61K8/85

CPC classification number: A61K8/0216 ,  A61K8/735 ,  A61K8/85 ,  A61K2800/413 ,  A61K2800/884 ,  A61Q1/02 ,  A61Q1/10 ,  A61Q1/12 ,  A61Q1/14 ,  A61Q17/04 ,  A61Q19/00

Abstract: The present invention provides a cosmetic method having an excellent roughness correction effect and easily removing makeup cosmetic and sun care cosmetic.The cosmetic method of the present invention has a step of pasting the base material film surface of a thin film on the skin, a step of removing the support body of the pasted thin film, a step of applying a makeup cosmetic and/or a sun care cosmetic on the skin, wherein the thin film consists of a base material film of the thickness of 10 to 500 nm and a support body.

Abstract translation: 本发明提供了具有优异的粗糙度校正效果并且容易地去除化妆品和防晒化妆品的化妆方法。 本发明的美容方法具有将薄膜的基材薄膜表面粘贴在皮肤上的步骤，去除粘贴薄膜的支撑体的步骤，涂敷化妆品和/或太阳的步骤 保护皮肤上的化妆品，其中薄膜由厚度为10至500nm的基材膜和支撑体组成。