公开(公告)号：US20170337945A1

公开(公告)日：2017-11-23

申请号：US15535982

申请日：2015-12-16

Applicant: SHOWA DENKO K.K.

Inventor： Satoru NAKAMURA ,  Taining HUNG ,  Evance KUO ,  Daizo ENDO

IPC: G11B5/725 ,  C10M111/04 ,  C10M105/54 ,  C10M107/38

CPC classification number: G11B5/725 ,  C10M105/54 ,  C10M107/38 ,  C10M111/04 ,  C10M2211/0425 ,  C10M2213/043 ,  C10N2220/021 ,  C10N2230/56 ,  C10N2240/20 ,  C10N2240/204 ,  C10N2250/08

Abstract: The present invention relates to a magnetic recording medium in which a lubricant layer contains a compound A represented by general formula (1) and a compound B represented by general formula (2), satisfying (A/B)=0.2 to 3.0, and has an average thickness of 0.8 nm to 2 nm. R1—C6H4OCH2CH(OH)CH2OCH2—R2—CH2OCH2CH(OH)CH2OH . . . (1) (R1 is an alkoxy group having 1 to 4 carbon atoms. R2 is —CF2O(CF2CF2O)x(CF2O)yCF2— (x, y=0 to 15), —CF2CF2O(CF2CF2CF2O)zCF2CF2— (z=1 to 15), —CF2CF2CF2O(CF2CF2CF2CF2)nCF2CF2CF2— (n=0 to 4). HOCH2CF2CF2O(CF2CF2CF2O)mCF2CF2CH2OCH2CH(OH)CH2OH . . . (2) (m is an integer).

公开(公告)号：US20170011765A1

公开(公告)日：2017-01-12

申请号：US15202674

申请日：2016-07-06

Applicant: SHOWA DENKO K.K.

Inventor： Satoru NAKAMURA ,  Taining HUNG ,  Evance KUO ,  Daizo ENDO

IPC: G11B5/725 ,  G11B5/64 ,  G11B5/72

CPC classification number: G11B5/725 ,  G11B5/72

Abstract: A magnetic recording medium 11 in which the outermost surface of a protective layer 3 on a lubricant layer 4 side contains carbon and nitrogen of 10 atomic % to 90 atomic %, the lubricant layer 4 is formed by being in contact with the outermost surface, and contains a compound A of Formula (1) and a compound B of Formula (2), a mass ratio (A/B) of the compound A with respect to the compound B is 0.2 to 0.3, the average molecular weights of the compounds A and B are 1,500 to 2,000 and 1,300 to 2,400, respectively, and the average film thickness is 0.5 nm to 2 nm. R1-C6H4OCH2CH(OH)CH2OCH2—R2-CH2OCH2CH(OH)CH2OH   (1) (R1 is an alkoxy group having 1 to 4 carbon atoms. R2 is —CF2O(CF2CF2O)x(CF2O)yCF2—.) HOCH2CF2CF2O(CF2CF2CF2O)mCF2CF2CH2OCH2CH(OH)CH2OH   (2)