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公开(公告)号：US20230093682A1
公开(公告)日：2023-03-23
申请号：US17934402
申请日：2022-09-22
Applicant: SINTX TECHNOLOGIES, INC.
Inventor： Bryan J. McEntire , Ryan M. Bock , Clayton Ashcroft , Bhajanjit Singh Bal
IPC: C04B35/584 , A61L27/10
Abstract: The present disclosure relates to the manufacture of silicon nitride implants with increased surface roughness and porosity.
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