公开(公告)号：US11488844B2

公开(公告)日：2022-11-01

申请号：US17145647

申请日：2021-01-11

申请人： SK SILTRON CO., LTD.

发明人： Ki Soo Kwon ,  Joo Won Choi

IPC分类号： H01L21/00 ,  H01L21/67 ,  H01L21/02

摘要： Disclosed is a first cleaning apparatus including a first cleaning bath, a cover provided at the upper part of the first cleaning bath, a drainage portion provided at the lower part of the first cleaning bath, a first cleaning unit and a second cleaning unit provided respectively at a first side surface and a second side surface in the first cleaning bath, and first and second moving units configured to move the first and second cleaning units, respectively, wherein each of the first and second cleaning units includes a plurality of cleaning solution supply pipes provided at different heights and a plurality of nozzles provided at each of the cleaning solution supply pipes, the nozzles provided at one cleaning solution supply pipe have identical cleaning solution spray angles, and the nozzles provided at the other cleaning solution supply pipes have different cleaning solution spray angles.