METHOD AND DEVICE FOR CLEAVING WAFERS
    2.
    发明申请
    METHOD AND DEVICE FOR CLEAVING WAFERS 审中-公开
    用于清洗波形的方法和装置

    公开(公告)号:US20140263524A1

    公开(公告)日:2014-09-18

    申请号:US13795896

    申请日:2013-03-12

    IPC分类号: B26F3/00

    摘要: A method for cleaving wafers comprising the following steps: providing a slice of a crystalline material with at least a first plane side, providing at least one stressing means to be attached to said slice, wherein said at least one stressing means is at least in parts made of a material with a coefficient of thermal expansion different from that of the slice, attaching said stressing means to said first plane side of said slice to form a stack, inducing a thermal shear stress to said slice by applying a temperature change to said stack.

    摘要翻译: 一种用于切割晶片的方法,包括以下步骤:提供具有至少第一平面侧的结晶材料切片,提供至少一个应力装置以附接到所述切片,其中所述至少一个应力装置是至少部分 由与所述切片不同的热膨胀系数的材料制成,将所述应力装置附接到所述切片的所述第一平面侧以形成堆叠,通过对所述堆叠施加温度变化来引起对所述切片的热剪切应力 。