公开(公告)号：US20210216009A1

公开(公告)日：2021-07-15

申请号：US15999759

申请日：2017-12-07

Applicant: SOUTH UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA

Inventor： Xing Cheng ,  Guixin Li ,  Xin Zhuang ,  Junhong Deng

IPC: G03F1/78 ,  G03F7/033 ,  G03F1/60

Abstract: The present application discloses a method for preparing optical metasurfaces, wherein the method is performed based on nano-imprinting, and the template used in the method is an imprinting template with patterns of meta-atoms. The method for preparing optical metasurfaces provided by the present application can replace the electron beam lithography method used in fabricating meta-atoms, greatly reducing the costs, and greatly reducing the production time. The method provided by the present application significantly improves the production cost and the production time, achieving a low-cost, large-scale fabrication of metasurface-based optical elements within a short time, and having good industrialization prospects.