公开(公告)号：US20190128894A1

公开(公告)日：2019-05-02

申请号：US15801070

申请日：2017-11-01

Applicant: STC.UNM

Inventor： Ravinder Jain ,  Abhaya K. Datye ,  Ying-Bing Jiang

IPC: G01N33/58 ,  A61K41/00 ,  A61K9/51 ,  A61P35/00 ,  G01N33/84 ,  G01N21/65

Abstract: A method of making free-standing ALD-coated plasmonic nanoparticles. The method comprises providing a plurality of semiconductor quantum dots. One or more conformal layers of dielectric material are deposited over the quantum dots to form dielectric-coated quantum dots. A conformal metallic nanoshell is deposted over the dielectric-coated quantum dots to form plasmonic nanoparticles. At least one layer chosen from i) the conformal layers of dielectric material and ii) the conformal metallic nanoshell is deposited using a vapor phase atomic layer deposition (ALD) process. Plasmonic nanoparticles and systems employing the nanoparticles are also disclosed.