公开(公告)号：US10475673B2

公开(公告)日：2019-11-12

申请号：US15715940

申请日：2017-09-26

Applicant: STMICROELECTRONICS S.R.L.

Inventor： Ruggero Anzalone ,  Nicolo Frazzetto ,  Aldo Raciti ,  Marco Antonio Salanitri ,  Giuseppe Abbondanza ,  Giuseppe D'Arrigo

IPC: H01L21/67 ,  H01L21/02 ,  H01L21/687 ,  C23C16/32 ,  C23C16/458

Abstract: Various embodiments provide a reaction chamber including a support, a receptacle, and a sponge. The support includes a plurality of bars that are spaced from each other by a plurality of openings. Each of the bars has side surfaces that are slanted or tilted downward such that melted material may readily flow through the openings. The support is covered with a coating of silicon carbide to prevent materials from adhering to the support. The receptacle underlies the support and is configured to collect any melted material that is drained through the openings of the support. The sponge is positioned in the receptacle and under the support. The sponge is configured to absorb any melted material that is collected by the receptacle.