CMOS CELL PRODUCED IN FD-SOI TECHNOLOGY
    1.
    发明申请
    CMOS CELL PRODUCED IN FD-SOI TECHNOLOGY 有权
    在FD-SOI技术中生产的CMOS电池

    公开(公告)号:US20140167167A1

    公开(公告)日:2014-06-19

    申请号:US14096509

    申请日:2013-12-04

    CPC classification number: H01L27/1203 H01L21/84 H01L29/78648

    Abstract: An integrated cell may include an nMOS transistor, and an pMOS transistor. The cell may be produced in fully depleted silicon-on-insulator technology, and it is possible for the substrates of the transistors of the cell to be biased with the same adjustable biasing voltage.

    Abstract translation: 集成单元可以包括nMOS晶体管和pMOS晶体管。 电池可以在完全耗尽的绝缘体上的技术中制造,并且可以以相同的可调偏置电压来偏置电池的晶体管的衬底。

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